Dr Daniel Loch
Postdoctoral Ï㽶ÊÓƵer
Summary
Daniel graduated from the Jade University of Applied Sciences in Wilhelmshaven, Germany, as Dipl.-Ing. (FH) in Mechatronics in 2009. After writing his diploma thesis on modulated pulse plasma technology at the Fraunhofer Institute for Surface Technology (IST) in Braunschweig, Germany, he joined Ï㽶ÊÓƵ to work on the development of a novel pulsed plasma source. He was awarded the Joint SHU-Fraunhofer IST Ï㽶ÊÓƵ Centre Award in 2016.
About
Daniel is part of the National HIPIMS Technology Centre where he obtained a PhD in Plasma Science and Materials Engineering in 2015. Prior to joining SHU he received his degree as Diplom Ingenieur (FH) in Mechatronics from the Jade University of Applied Sciences in Wilhelmshaven in 2009. He wrote his diploma thesis on reactive plasma process development with modulated pulse plasma technology at the Fraunhofer Institute for Surface Technology (IST) in Braunschweig, Germany.
During his time at SHU he has been developing and characterizing a novel PVD sputtering technique, Inductively Coupled Impulse Sputtering (ICIS). This new highly ionised sputtering technology has shown very promising results for the deposition of magnetic coatings into high aspect ratio structures which are particularly of interest for MagMEMS devices and sensors.
Daniel utilizes Plasma Sampling Mass Spectroscopy (MS) and Optical Emission Spectroscopy (OES) to analyse the plasma composition and Scanning Electron Microscopy (SEM), Energy Dispersive X-ray Spectroscopy (EDX), Raman Spectroscopy, Secondary Ion and Neutral Mass Spectroscopy (SIMS/SNMS) and Profilometry to characterize thin film properties.
In 2016 he received the for his work in developing ICIS processes and investigating the plasma properties of ICIS generated plasma.
- Highly ionized pulse plasma technology
- Magnetic thin films
- Electrically insulating coatings
Publications
Journal articles
Alam, A.E., Olusola, O.I., Loch, D.A.L., Shukla, K., Cranton, W.M., & Dharmadasa, I. (2020). . Scientific Reports, 10 (1), 21445.
Bower, R., Loch, D., Ware, E., Berenov, A., Zou, B., Hovsepian, P., ... Petrov, P. (2020). . ACS Applied Materials and Interfaces.
Biswas, B., Purandare, Y., Arunachalamsugumaran, A., Loch, D., Creasy, S., Khan, I., ... Hovsepian, P. (2017). . Thin Solid Films, 636, 558-566.
Loch, D., Aranda Gonzalvo, Y., & Ehiasarian, A. (2017). . Plasma Sources Science and Technology, 26 (6).
Loch, D., & Ehiasarian, A. (2016). . Surface and coatings technology, 327, 200-206.
Loch, D.A.L., Gonzalvo, Y.A., & Ehiasarian, A.P. (2015). . Surface and coatings technology, 267, 98-104.
Hovsepian, P., Arunachalamsugumaran, A., Purandare, Y., Loch, D., & Ehiasarian, A. (2014). . Thin Solid Films, 562, 132-139.
Lewin, E., Loch, D., Montagne, A., Ehiasarian, A.P., & Patscheider, J. (2013). . Surface and coatings technology, 232, 680-689.
Gerdes, H., Bandorf, R., Loch, D., & Bräuer, G. (2012). Reactive Sputter Deposition of Alumina Coatings. IOP Conference Series: Materials Science and Engineering, 39, 012009.
Conference papers
Shukla, K., Purandare, Y., Sugumaran, A., Loch, D., Ehiasarian, A., Khan, I., & Hovsepian, P. (2021). . 64th Annual Technical Conference Proceedings.
Loch, D., & Ehiasarian, A.P. (2015). Nickel Coatings by Inductively Coupled Impulse Sputtering (ICIS). Annual Technical Conference Proceedings, 57, 105-113.
Loch, D., & Ehiasarian, A. (2012). . IOP Conference Series: Materials Science and Engineering, 39 (012006).
Posters
Shukla, K., Purandare, Y., Loch, D., Sugumaran, A., Kahn, I., Ehiasarian, A., & Hovsepian, P. (2020). . Presented at: I2RI Winter Poster Session, Virtual, 2020
Shukla, K., Purandare, Y., Loch, D., Sugumaran, A., Kahn, I., Ehiasarian, A., & Hovsepian, P. (2020). . Presented at: I2RI Winter Poster Session, Virtual, 2020
Shukla, K., Purandare, Y., Loch, D., Sugumaran, A., Kahn, I., Ehiasarian, A., & Hovsepian, P. (2020). . Presented at: I2RI Winter Poster Session, Virtual, 2020